EULITHA was founded in 2006 in the canton Aargau of Switzerland. Its founders have led the development of Extreme Ultraviolet Interference Technology at the Paul Scherrer Institute. Having entered the market with products based on its EUV technology, Eulitha has expanded its range of products with the addition of state-of-the-art electron beam lithography technology to its capabilities. In 2010, Eulitha announced the breakthrough PHABLE™ technology, which greatly simplifies production of periodic nanostructures over wafer scale areas. The company has a global customer base of researchers from industrial and academic laboratories. Backed by private Swiss equity Eulitha serves its growing number of customers from two locations in Kirchdorf and the Paul Scherrer Institute.
PHABLE Technology
- Patented unique non-contact photolithography method
- High resolution of less than 60nm feature size
- Well shaped nano features
- Fast & low-cost patterning of large areas with periodic nano-structures
- Technology scalable and suitable for industrial production
Lithography Systems
PhableR Line - for Lab & Small Volume
PhableR UV
- Manual System
- Pieces to 200mm substrates
- Resolution 125nm half pitch for L&S guaranteed
- Throughput ≥ 10wph
- Exposure time < 2min. / substrate
- Overlay alignment manual
PhableR DUV
- Manual System
- Pieces to 200mm substrates
- Resolution 60nm half pitch for L&S guaranteed
- Throughput ≥ 10wph
- Exposure time < 2min. / substrate
- Overlay alignment manual
Lithography Systems
PhableR line - for Lab & Small volume
PhableX UV
- Manual & automated System
- Pieces to 200mm substrates
- Resolution 125nm half pitch for L&S guaranteed
- Throughput up to >40wph (first layer)
- Exposure time < 2min. / substrate
- FS <1um, BS <5um, automatic or by operator
PhableX DUV
- Manual & Automated System
- Pieces to 200mm substrates
- Resolution 60nm half pitch for L&S guaranteed
- Throughput up to >40wph (first layer)
- Exposure time < 2min. / substrate
- FS <1um, BS <5um, automatic or by operator
Custom & Standard Patterning
Eulitha offers e-beam patterning services to academic & industrial customers for either direct use in experiments and devices or for production of replication templates.
Typical Production Steps:
- Specification of customer requirements, e.g. substrate, pattern layout, resolution, feature height and profile
- Proposal from Eulitha including alternative approaches in consideration of quality, cost and manufacturability
- Transfer of substrates and layout files (if applicable) from customer to Eulitha
- Pattern realization through ebeam exposure including any pattern transfer steps, e.g. etching
- Characterization (e.g. SEM, optical microscopy)
Ebeam made - Large area nano hole & Pillar patterns
An efficient process for fabricating unique nanohole and pillar arrays over areas that were considered too large to be affordable until now.
Nanoholes formed with the newly developed process are etched into silicon substrates up to an aspect ratio (depth/diameter ratio) of 3.
The period of the nanohole patterns is freely adjustable to anywhere between 70 nm to tens of microns. Nanopillars can have pitch down to 100 nm and height up to 200nm.
PHABLE - MADE STANDARD PATTERNS
Eulitha's photonic templates are made with its revolutionary PHABLE™ technology, which guarantees highest quality at an affordable price.
Optimized silicon and quartz etching yields hole and pillar patterns with a slight positive slope that facilitates the imprint process. Standard templates with square and hexagonal lattices as well as linear gratings are available.
EUV Gratings
Eulitha offer EUV transmission diffraction gratings with periods down to 50 nm patterned on thin silicon or silicon nitride membranes. Our years of experience on EUV-IL have led to many improvements in the design and manufacturing of these high specialty devices. Our diffraction gratings are used in EUV spectroscopy and lithography setups. We provide help with optimum gratings design for your application.